发明名称 FIELD EFFECT TRANSISTOR
摘要 <p>A field effect transistor (HEMT) using a two-dimensional electron gas is provided with a semiconductor substrate (1) which includes an electron transit layer (8) and an n-type electron supplying layer (9). On one main plane of the semiconductor substrate (1), a source electrode (3), a drain electrode (4) and a gate electrode (5) are formed. The gate electrode (5) is arranged between the source electrode (3) and the drain electrode (4). On the one main plane (12) of the semiconductor substrate (1), a p-type organic semiconductor film (6) is arranged. The p-type organic semiconductor film (6) reduces current collapse.</p>
申请公布号 WO2007007486(A1) 申请公布日期 2007.01.18
申请号 WO2006JP311214 申请日期 2006.06.05
申请人 SANKEN ELECTRIC CO., LTD.;OTSUKA, KOJI;MACHIDA, OSAMU;MUROFUSHI, HITOSHI 发明人 OTSUKA, KOJI;MACHIDA, OSAMU;MUROFUSHI, HITOSHI
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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