发明名称 Method and system for calibrating measurement tools for semiconductor device manufacturing
摘要 A method and system for calibrating a plurality of measurement systems. The method includes obtaining a first plurality of calibration standards. The first plurality of calibration standards is associated with a plurality of predetermined values. Additionally, the method includes measuring the first plurality of calibration standards by a plurality of measurement systems to obtain a first plurality of measured values, processing information associated with the first plurality of measured values, and selecting a first measurement system from the plurality of measurement systems based on at least information associated with the first plurality of measured values. Moreover, the method includes calibrating the first measurement system with the first plurality of calibration standards, obtaining a second plurality of calibration standards, and measuring the second plurality of calibration standards by the first measurement system to obtain a second plurality of measured values.
申请公布号 US2007013388(A1) 申请公布日期 2007.01.18
申请号 US20050193016 申请日期 2005.07.29
申请人 SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION 发明人 WANG EUGENE;CHEN YU
分类号 G01R35/00 主分类号 G01R35/00
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