发明名称 |
REMOVAL OF PARTICLES GENERATED BY A RADIATION SOURCE |
摘要 |
<p>A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle trap arranged in a wall of a chamber. In order to protect an optical device and/or articles to be irradiated against contamination, the method introducing a second gas into the chamber and its pressure is adjusted such that it is at least as high as the pressure of the first gas.</p> |
申请公布号 |
EP1743221(A2) |
申请公布日期 |
2007.01.17 |
申请号 |
EP20050709038 |
申请日期 |
2005.03.18 |
申请人 |
PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH;KONINKLIJKE PHILIPS ELECTRONICS N.V.;ASML NETHERLANDS B.V. |
发明人 |
JONKERS, J.,;BAKKER, L. P.,;SCHUURMANS, F., |
分类号 |
G03F7/20;H05G2/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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