发明名称 METHOD FOR FORMING SURFACE GRAFT, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING METAL PATTERN, METHOD FOR FORMING MULTILAYER WIRING BOARD, SURFACE GRAFT MATERIAL, AND CONDUCTIVE MATERIAL
摘要 <p>The present invention provides a method for forming a surface graft, comprising the process of applying energy to the surface of a substrate containing polyimide having a polymerization initiating moiety in the skeleton thereof, to generate active points on the surface of the substrate and to generate a graft polymer that is directly bonded to the surface of the substrate starting from the active points and that has a polar group, and a surface graft material obtained thereby. The present invention also provides a method for forming a conductive film, comprising the processes of applying energy to the surface of a substrate containing polyimide having a polymerization initiating moiety in the skeleton thereof, to generate active points on the surface of the substrate and to generate a graft polymer that is directly bonded to the surface of the substrate starting from the active points and that has a polar group, and causing a conductive material to adhere to the graft polymer, and a conductive material obtained thereby.</p>
申请公布号 EP1742991(A1) 申请公布日期 2007.01.17
申请号 EP20050727375 申请日期 2005.03.24
申请人 FUJIFILM CORPORATION 发明人 KANO, TAKEYOSHI;KAWAMURA, KOICHI
分类号 C08J7/16;C08J7/18;B32B27/34;C23C18/16;C23C18/20;C23C18/28;C25D5/34;H05K3/00;H05K3/06;H05K3/38;H05K3/46 主分类号 C08J7/16
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