发明名称 APPARATUS AND METHOD OF MEASURING THE CURVATURE USING ARRAYED MULTIPLE BEAM
摘要 An apparatus for measuring curvature using arrayed multiple beams and a method thereof are provided to project the vertical incidence angle by using the view port and to reduce size by using the VCSEL or LD array. An apparatus(T1) for measuring curvature is composed of an m x n light source array(10) for generating the m x n multiple beam; a single collimating lens unit making the m x n multiple beam generated from the m x n light source array into an m x n non-parallel beam(C2) and projecting the m x n non-parallel beam on the sample surface; and a detector(40) for measuring the interval change between the m x n spot arrays of the m x n multiple beam reflected from the sample surface.
申请公布号 KR100669040(B1) 申请公布日期 2007.01.16
申请号 KR20060052025 申请日期 2006.06.09
申请人 NANOTRON TECHNOLOGIES, INC. 发明人 KEE, BONG;YOON, EUI JOON
分类号 G01B11/24;G01L1/24 主分类号 G01B11/24
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