| 摘要 |
A deposition apparatus is provided to maintain a deposition speed constantly by adjusting a diameter of an opening through which a vapor of deposition material is discharged. A deposition apparatus includes a chamber in which a process of forming a deposition film on a surface of a substrate is performed, and a deposition source(1) installed in the chamber. An opening adjusting member is installed to a lower portion of an opening of a cell cap configuring the deposition source. The opening adjusting member consists of unit members moved along a frame in a circumference and diameter direction by a drive unit(D). A sensor(R) for detecting a thickness of the deposition film is installed to one side of the deposition source. |
