发明名称 POSITIVE LIGHT-SENSITIVE RESIN COMPOSITION, RELIEF PATTERN USING THE SAME, AND SOLID IMAGING ELEMENT
摘要 <p>A positive light-sensitive resin composition which comprises (a) 100 parts by weight of a polymer having an alkali-soluble group, (b) 1 to 30 parts by weight of a compound which absorbs a light having an exposure wave length and is not faded by the light, (c) 1 to 50 parts by weight of a quinonediazide compound and (d) 5 to 500 parts by weight of an inorganic particle having a particle diameter of 1 nm to 30 nm of at least one compound selected from an aluminum compound, a silicon compound, a tin compound, a titanium compound and a zirconium comound. The above composition is almost insoluble in an alkaline developing solution and easily soluble in the alkaline developing solution after exposure, and thus can resolve a fine pattern, and further can provide an article of a lens form exhibiting high transparency and a high refractive index and capable of being used as an optical element. ® KIPO & WIPO 2007</p>
申请公布号 KR20070007095(A) 申请公布日期 2007.01.12
申请号 KR20067018518 申请日期 2006.09.11
申请人 TORAY INDUSTRIES, INC. 发明人 SUWA MITSUHITO;MINAMIHASHI KATSUYA
分类号 G03F7/039;G02B1/04;G03F7/004;G03F7/022;G03F7/023;G03F7/031;G03F7/037;G03F7/40;H01L21/027 主分类号 G03F7/039
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