发明名称 |
Cleaning agent composition, cleaning and production methods for semiconductor wafer, and semiconductor wafer |
摘要 |
A cleaning agent composition comprising a nonionic surfactant represented by the following formula (1): R1O(EO)x(PO)yH (I)(wherein R1 represents a linear or branched alkyl group having from 6 to 20 carbon atoms or a linear or branched alkenyl group having from 6 to 20 carbon atoms, EO represents an oxyethylene group, PO represents an oxypropylene group, EO and PO each is bonded by random addition or block addition, x number of EOs and y number of POs are arranged in an arbitrary order, x and y each independently represents an integer of 1 to 20, and x/(x+y) is 0.5 or more) and a quaternary ammonium hydroxide) is provided. Also, cleaning and production methods for semiconductor wafer using the cleaning agent composition and semiconductor wafer produced by the production method are provided.
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申请公布号 |
US2007010411(A1) |
申请公布日期 |
2007.01.11 |
申请号 |
US20030538929 |
申请日期 |
2003.12.10 |
申请人 |
AMEMIYA MASAHIRO;TANAKA YOSHIO |
发明人 |
AMEMIYA MASAHIRO;TANAKA YOSHIO |
分类号 |
C11D1/722;C11D7/32;C11D3/26;C11D3/30;C11D3/39;C11D11/00;C11D17/00;H01L21/302;H01L21/304;H01L21/306 |
主分类号 |
C11D1/722 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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