EXPOSURE SYSTEM AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an exposure system capable of maintaining exposure accuracy and measurement accuracy by preventing a liquid filled in an optical path space of an exposure light from flowing out.

SOLUTION: The exposure system EX is provided with a recovery port 22 provided on a predetermined position with respect to an optical path space K1 of an exposure light EL and recovering a liquid LQ; a first jetting port 32 provided on the outside of the recovery port 22 with respect to the optical path space K1 and jetting a gas; and a second jetting port 52 provided on the outside of the first jetting port 32 with respect to the optical path space K1 and jetting a gas.

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