发明名称 Method to fabricate horizontal air columns underneath metal inductor
摘要 A new method is provided for creating an inductor on the surface of a silicon substrate. The invention provides overlying layers of oxide fins beneath a metal inductor. The oxide fins provide the stability support for the overlying metal inductor while also allowing horizontal air columns to simultaneously exist underneath the inductor. Overlying layers of air cavities that are spatially inserted between the created overlying layers of oxide fins can be created under the invention by repetitive application of the mask used. The presence of the air wells on the surface of the substrate significantly reduces parasitic capacitances and series resistance of the inductor associated with the substrate.
申请公布号 US2007007623(A1) 申请公布日期 2007.01.11
申请号 US20060519103 申请日期 2006.09.11
申请人 NATIONAL UNIVERSITY OF SINGAPORE 发明人 CHAN LAP;CHEW KOK WAI JOHNNY;CHA CHER LIANG;CHUA CHEE TEE
分类号 H01L29/00;H01F3/14;H01F17/00;H01F17/02;H01F27/34;H01F41/04;H01L21/02;H01L21/764;H01L21/768;H01L23/522;H01L23/532;H01L23/64;H01L27/08 主分类号 H01L29/00
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