METHOD FOR PRODUCING PATTERN, METHOD FOR PROCESSING DATA, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND DATA PROCESSING PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a pattern for decreasing difficulty in a lithographic process.

SOLUTION: The method includes: a step S102 of extracting a correction object pattern having a dimension equal to or less than a threshold from first design data of a semiconductor device; a step S103 of calculating first characteristics of the semiconductor device based on the first design data; a step S104 of generating second design data by correcting the correction object pattern included in the first design data; a step S105 of calculating second characteristics of the semiconductor device based on the second design data; a step S106 of inspecting whether the characteristics difference between the first characteristics and the second characteristics is no more than an allowed value; and a step S107 of deciding to use the second design data for the manufacture of the semiconductor device when the characteristics difference is no more than the allowed value.

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