发明名称 PATTERN FORMING BODY AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern forming body capable of forming a high definition functional part on various substrates and to provide a manufacturing method of the pattern forming body. <P>SOLUTION: The manufacturing method of the pattern forming body has a plasma irradiation process in which a patterning substrate having: a base material; an intermediate layer formed on the substrate and including a silane coupling agent or a polymer of the silane coupling agent ; and the resin layer formed in a pattern shape on the intermediate layer, is irradiated with plasma from the side of a resin layer by using fluorine gas as an introduction gas. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007003755(A) 申请公布日期 2007.01.11
申请号 JP20050182997 申请日期 2005.06.23
申请人 DAINIPPON PRINTING CO LTD 发明人 KOBAYASHI HIRONORI
分类号 G02B5/20;C12M3/00;H01L51/50;H05B33/10;H05B33/12 主分类号 G02B5/20
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