发明名称 |
PATTERN FORMING BODY AND ITS MANUFACTURING METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern forming body capable of forming a high definition functional part on various substrates and to provide a manufacturing method of the pattern forming body. <P>SOLUTION: The manufacturing method of the pattern forming body has a plasma irradiation process in which a patterning substrate having: a base material; an intermediate layer formed on the substrate and including a silane coupling agent or a polymer of the silane coupling agent ; and the resin layer formed in a pattern shape on the intermediate layer, is irradiated with plasma from the side of a resin layer by using fluorine gas as an introduction gas. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
申请公布号 |
JP2007003755(A) |
申请公布日期 |
2007.01.11 |
申请号 |
JP20050182997 |
申请日期 |
2005.06.23 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
KOBAYASHI HIRONORI |
分类号 |
G02B5/20;C12M3/00;H01L51/50;H05B33/10;H05B33/12 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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