SOURCE SIDE INJECTION STORAGE DEVICE AND METHOD THEREFOR
摘要
<p>A storage device (10) has a two bit cell in which the select electrode (52) is nearest the channel between two storage layers (38, 40). Individual control electrodes (20, 22) are over individual storage layers (38, 40). Adjacent cells are separated by a doped region (34) that is shared between the adjacent cells. The doped region (34) is formed by an implant in which the control gates (22, 24) of adjacent cells are used as a mask. This structure provides for reduced area while retaining the ability to perform programming by source side injection.</p>
申请公布号
WO2007005189(A2)
申请公布日期
2007.01.11
申请号
WO2006US22277
申请日期
2006.06.08
申请人
FREESCALE SEMICONDUCTOR;HONG, CHEONG, M.;CHINDALORE, GOWRISHANKAR, L.