发明名称 PHOTOSENSITIVE RESIN COMPOSITION, AND, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PRINTED WIRING BOARD AND METHOD FOR MANUFACTURING PARTITION WALL FOR PLASMA DISPLAY PANEL USING THE COMPOSITION
摘要 <p>A photosensitive resin composition which comprises (A) a binder polymer, (B) a photo-polymerizable compound having a polymerizable ethylenic unsaturated bond, (C) a photo-radical polymerization initiator comprising a 2,4,5-triaryl imidazole dimer or a derivative thereof and (D) a compound represented by the following general formula (1): (1) wherein R<SUP>1 </SUP>and R<SUP>2</SUP> each independently represent an alkyl group having 1 to 20 carbon atoms or the like, and R<SUP>3</SUP>, R<SUP>4</SUP>, R<SUP>5</SUP>, R<SUP>6</SUP>, R<SUP>7</SUP>, R<SUP>8</SUP>, R<SUP>9</SUP> and R<SUP>10 </SUP>each independently represent a hydrogen atom or the like.</p>
申请公布号 WO2007004619(A1) 申请公布日期 2007.01.11
申请号 WO2006JP313245 申请日期 2006.07.03
申请人 HITACHI CHEMICAL COMPANY, LTD.;MIYASAKA, MASAHIRO;KUMAKI, TAKASHI 发明人 MIYASAKA, MASAHIRO;KUMAKI, TAKASHI
分类号 G03F7/031;G03F7/004;G03F7/029;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01J11/36;H05K3/00;H05K3/06 主分类号 G03F7/031
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