发明名称 LED WITH METAL NITRIDE LAYER AND METHOD OF FORMING THE SAME
摘要 A light emitting diode having a metal nitride layer and its manufacturing method are provided to reduce defect density by growing an N-gallium nitride layer on the metal nitride layer. A metal nitride layer(11) is formed on a substrate(10). An N-gallium nitride layer(12) is formed on the metal nitride layer. An active layer(13) is formed on the N-gallium nitride layer. A P-gallium nitride layer(14) is formed on the active layer. A reflection layer(21) formed on a lower portion of the substrate. The metal nitride layer has a thickness of 5 to 200 nano-meters and a thermal treatment process is performed thereon at 600 to 1000‹C.
申请公布号 KR100667506(B1) 申请公布日期 2007.01.10
申请号 KR20050070585 申请日期 2005.08.02
申请人 LG ELECTRONICS INC.;LG INNOTEK CO., LTD. 发明人 CHO, HYUN KYONG;KIM, JONG WOOK
分类号 H01L33/60;H01L33/02 主分类号 H01L33/60
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