发明名称 |
METHOD FOR SELECTIVE ETCHING |
摘要 |
Disclosed is a method of selective etching a first material on a substrate with a high selectivity towards a second material by flowing a liquid etchant across a substrate surface at a flow sufficient fast to generate a mininun mean velocity v parallel to the substrate's surface. ® KIPO & WIPO 2007
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申请公布号 |
KR20070005612(A) |
申请公布日期 |
2007.01.10 |
申请号 |
KR20067018098 |
申请日期 |
2006.09.05 |
申请人 |
SEZ AG |
发明人 |
KRAUS HARALD;CLAES MARTINE |
分类号 |
H01L21/3063;H01L21/311;H01L21/336 |
主分类号 |
H01L21/3063 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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