| 发明名称 |
ALKALINE ETCHANT FOR CONTROLLING SURFACE ROUGHNESS OF SEMICONDUCTOR WAFER |
| 摘要 |
<p>An alkali etchant for controlling surface roughness of a semiconductor wafer, which is a sodium hydroxide solution or a potassium hydroxide solution having a weight concentration of 55 wt% to 70 wt%.</p> |
| 申请公布号 |
EP1742256(A1) |
申请公布日期 |
2007.01.10 |
| 申请号 |
EP20050726977 |
申请日期 |
2005.03.25 |
| 申请人 |
SUMCO CORPORATION |
发明人 |
KOYATA, SAKAE;TAKAISHI, KAZUSHIGE |
| 分类号 |
H01L21/306;C09K13/02;H01L21/308 |
主分类号 |
H01L21/306 |
| 代理机构 |
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代理人 |
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| 地址 |
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