MANUFACTURING METHOD OF BLANKMASK AND PHOTOMASK FOR GRAY-TONE

摘要

A method for manufacturing a gray-tone blank mask and a method for manufacturing a gray-tone photo mask are provided to uniformly control the thickness of a resist film remaining in a semi-transmissive region during an exposure process and a developing process, by using a semi-transmissive film instead of a slit pattern. A light shielding layer(104b) is formed on a transparent substrate(102). The light shielding layer is pattern-etched to form an opening for exposing a surface of the transparent substrate. A semi-transmissive layer(110a) is formed on the resultant substrate including the opening. A resist film(112a) is formed on the semi-transmissive layer. An anti-reflective layer(106b) is capable of being formed on the light shielding layer, wherein the anti-reflective layer has the same pattern as the light shielding layer.