SPIN-COATING APPARATUS USED IN FABRICATING SEMICONDUCTOR DEVICES

摘要

A spin coating equipment for use in manufacturing of a semiconductor device is provided to minimize particle type contamination source on a wafer by using a preventive wall with an opening unit. A bowl(105) has an inner space where a spin coating process is performed. A spin unit(152) rotates a wafer loaded in the bowl in a fixed state thereof. At least one auxiliary exhaust pipe(110) is formed on a base plate of the bowl. A main exhaust pipe(115) is formed on the base plate located between sidewalls of the auxiliary exhaust pipe and the bowl. A preventive wall(120) is upwardly extended from the base plate of the bowl located between the auxiliary and main exhaust pipes. The preventive wall includes at least opening unit(125). The opening unit passes through the preventive wall and connects both spaces of the prevention wall.