发明名称 Method for forming a semiconductor product and semiconductor product
摘要 A semiconductor product includes, a substrate with a first dielectric layer having contact hole fillings for contacting active areas in the substrate. A second dielectric layer with contact holes is provided therein. The contact holes have a width in a first lateral direction. The product further includes conductive lines, each conductive line passing over contact holes in the second dielectric layer and contacting a plurality of contact hole fillings in the first dielectric layer. The conductive lines have a width, in the first lateral direction, that is smaller than the width of the contact holes of the second dielectric layer. The conductive lines are in direct mechanical contact with the contact hole fillings and thereby remove the need to provide any conventional "contact to interconnect" structures.
申请公布号 US2007001305(A1) 申请公布日期 2007.01.04
申请号 US20050172366 申请日期 2005.06.30
申请人 MIKOLAJICK THOMAS;MUELLER TORSTEN;NAGEL NICOLAS;BACH LARS;OLLIGS DOMINIK;POLEI VERONIKA 发明人 MIKOLAJICK THOMAS;MUELLER TORSTEN;NAGEL NICOLAS;BACH LARS;OLLIGS DOMINIK;POLEI VERONIKA
分类号 H01L23/52;H01L21/4763 主分类号 H01L23/52
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