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发明名称
氮化物类化合物半导体发光元件之制造方法
摘要
于氮化物系化合物半导体发光元件之制造方法中,于基板(10)上形成含有复数个氮化物系化合物半导体层(5,6)之半导体积层构造,利用雷射照射将基板自半导体积层构造剥离,并且洗净基板剥离后所露出之半导体积层构造之露出表面(81),于该经洗净之露出表面上形成电极(7;11)。
申请公布号
TW200701516
申请公布日期
2007.01.01
申请号
TW094142795
申请日期
2005.12.05
申请人
夏普股份有限公司
发明人
幡俊雄
分类号
H01L33/00(2006.01)
主分类号
H01L33/00(2006.01)
代理机构
代理人
陈长文;林宗宏
主权项
地址
日本
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