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发明名称
P型金氧半导体电晶体与半导体元件及其形成方法
摘要
一种具有降低源极或汲极区域中掺杂物扩散之的PMOS电晶体及其形成方法。PMOS电晶体包括掺杂P型杂质及扩散延迟材料的源极或汲极区域。PMOS电晶体更包括一闸极介电层,位于半导体基板的通道上、一闸极电极,位于闸极介电层之上以及一轻掺杂源极或汲极区域对齐闸极电极之边缘。其中扩散延迟材料较佳包括碳、氟、氮或上述材料之组合。
申请公布号
TW200701455
申请公布日期
2007.01.01
申请号
TW094141261
申请日期
2005.11.24
申请人
台湾积体电路制造股份有限公司
发明人
陈建豪;聂俊峰;李资良;陈世昌
分类号
H01L29/772(2006.01);H01L21/324(2006.01);H01L21/265(2006.01)
主分类号
H01L29/772(2006.01)
代理机构
代理人
洪澄文;颜锦顺
主权项
地址
新竹市新竹科学工业园区力行六路8号
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