| 摘要 |
<p>A method for forming an exposure mask is provided to form a proper photosensitive film pattern on a wafer by compensating an error which is produced in a mask pattern formed on a mask substrate. A specific mask pattern(102) is formed on a mask substrate(100). Light transmittance is measured for each of regions of the mask substrate with the mask pattern formed thereon. In case unwanted light transmittance is shown on a portion of the mask substrate, a light transmittance compensating substrate is prepared, in which a selectively permeable film(106) is formed on a transparent substrate(104). The light transmittance compensating substrate is attached to a rear surface of the mask substrate.</p> |
