| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition using a low-molecular-weight resin as a base resin and capable of forming a high-resolution resist pattern, and to provide a method of forming a resist pattern. <P>SOLUTION: The positive resist composition contains a resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) which generates an acid upon irradiation with a radiation, wherein the resin component (A) is the above resin having a mass average molecular weight of ≤4,000 obtained by anionic polymerization. <P>COPYRIGHT: (C)2007,JPO&INPIT |
