发明名称 PHOTOEMISSION ELECTRON MICROSCOPE SUPPRESSING CHARGING OR POTENTIAL STRAIN OF INSULATOR SAMPLE, AND SAMPLE OBSERVATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a technique for obtaining accurate energy spectral for obtaining a sharp electron image by suppressing the charging or potential strain on the surface of an insulator sample, caused when the insulator sample is observed in the field of an photoemission electron microscopic technique, and to provide a photoemission electron microscope that applies this technique. SOLUTION: In the method for observing the surface of the insulator sample, by irradiating the insulator sample installed on a sample stand, with an exciting light and forming the photoelectrons or secondary electrons emitted from the surface of the insulator sample into an image by a projection-type electro-optical system, the surface of the sample is vertically irradiated with a neutralizing electron beam, simultaneously with the exciting light from the region above an image forming opticial axis. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006349384(A) 申请公布日期 2006.12.28
申请号 JP20050172859 申请日期 2005.06.13
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 YASUFUKU HIDEYUKI;YOSHIKAWA HIDEKI
分类号 G01N23/227;H01J37/20;H01J37/285 主分类号 G01N23/227
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