发明名称 Method for producing single crystal of multi-element oxide single crystal containing bismuth as constituting element
摘要 The present invention provides methods for producing a multi-element oxide single crystal which contains Bi, which has high crystallinity independently of a preparation process, and which is represented by the formula (Bi<SUB>2</SUB>O<SUB>2</SUB>)A<SUB>m-1</SUB>B<SUB>m</SUB>O<SUB>3m+1</SUB>, wherein A is Sr, Ba, Ca, or Bi and B is Ti, Ta, or Nb. A flux layer, containing a composition satisfying the inequality 0<CUO/BI<SUB>2</SUB>O<SUB>3</SUB><2 and/or 0<=TIO/BI<SUB>2</SUB>O<SUB>3</SUB><7/6 on a molar basis is deposited on a wafer and a single-crystalline thin-film is then deposited on the flux layer placed on the wafer. A melt of a composition which contains raw materials and a flux and which satisfies the above inequality is prepared and the melt is cooled such that a single crystal is grown. A CuO flux layer is deposited on a wafer and Bi-Ti-O is supplied to the flux layer using a Bi<SUB>6</SUB>Ti<SUB>3</SUB>O<SUB>12</SUB>, Bi<SUB>7</SUB>Ti<SUB>3</SUB>O<SUB>12</SUB>, or Bi<SUB>8</SUB>Ti<SUB>3</SUB>O<SUB>12 </SUB>target of which the Bi content is greater than that of an object film such that a Bi<SUB>4</SUB>Ti<SUB>3</SUB>O<SUB>12 </SUB>single-crystalline thin-film is formed above the wafer.
申请公布号 US2006288925(A1) 申请公布日期 2006.12.28
申请号 US20050557044 申请日期 2005.11.16
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY 发明人 KOINUMA HIDEOMI;MATSUMOTO YUJI;TAKAHASHI RYOTA
分类号 C30B29/22;H01L21/322;C30B9/00;C30B9/12;C30B19/02;H01L21/8246;H01L27/105 主分类号 C30B29/22
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