摘要 |
The present invention provides methods for producing a multi-element oxide single crystal which contains Bi, which has high crystallinity independently of a preparation process, and which is represented by the formula (Bi<SUB>2</SUB>O<SUB>2</SUB>)A<SUB>m-1</SUB>B<SUB>m</SUB>O<SUB>3m+1</SUB>, wherein A is Sr, Ba, Ca, or Bi and B is Ti, Ta, or Nb. A flux layer, containing a composition satisfying the inequality 0<CUO/BI<SUB>2</SUB>O<SUB>3</SUB><2 and/or 0<=TIO/BI<SUB>2</SUB>O<SUB>3</SUB><7/6 on a molar basis is deposited on a wafer and a single-crystalline thin-film is then deposited on the flux layer placed on the wafer. A melt of a composition which contains raw materials and a flux and which satisfies the above inequality is prepared and the melt is cooled such that a single crystal is grown. A CuO flux layer is deposited on a wafer and Bi-Ti-O is supplied to the flux layer using a Bi<SUB>6</SUB>Ti<SUB>3</SUB>O<SUB>12</SUB>, Bi<SUB>7</SUB>Ti<SUB>3</SUB>O<SUB>12</SUB>, or Bi<SUB>8</SUB>Ti<SUB>3</SUB>O<SUB>12 </SUB>target of which the Bi content is greater than that of an object film such that a Bi<SUB>4</SUB>Ti<SUB>3</SUB>O<SUB>12 </SUB>single-crystalline thin-film is formed above the wafer.
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