| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in DOF (depth of focus) characteristics and to provide a method for forming a resist pattern. <P>SOLUTION: The positive resist composition contains a resin component (A) the alkali solubility of which is increased by the effect of an acid, an acid generating component (B) which generates an acid by exposure, and a nitrogen-containing organic compound (D), wherein the resin component (A) consists of a copolymer (A1) having a structural unit (a1) derived from an acrylic acid ester having an acid-dissociative solubility-inhibiting group, a structural unit (a2) derived from an acrylic acid ester having a lactone-containing cyclic group, and a structural unit (a3) derived from an acrylic acid ester having a polar group-containing aliphatic hydrocarbon group, and the nitrogen-containing organic compound (D) is a cyclic amine. <P>COPYRIGHT: (C)2007,JPO&INPIT |
