发明名称 EXHAUSTING APPARATUS OF LOW PRESSURE CHEMICAL VAPOUR DEPOSITION EQUIPMEENT
摘要 An exhaust apparatus of low pressure CVD equipment is provided to prevent the variation of a sensing pressure due to the increase of temperature in a safety cover by opening/closing automatically an exhaust line using a temperature measuring unit and an automatic control valve. An exhaust apparatus of low pressure CVD equipment includes an exhaust line, at least one or more pressure sensors, a safety cover, an exhaust line, an automatic control valve, and a temperature measuring unit. The exhaust line(141,146,148) is connected to a reaction tube to exhaust an inner gas from the reaction tube to the outside. The pressure sensors are installed on the exhaust line to detect indirectly an inner vacuum degree of the reaction tube through the exhaust line. The safety cover(150) is used for sealing pressure sensor installing portions. The exhaust pipeline(152) is connected to the safety cover. The automatic control valve(151) is installed on the exhaust pipeline to close or open the exhaust pipeline. The temperature measuring unit(153) is used for detecting an inner temperature of a predetermined space, wherein the predetermined space is sealed by the safety cover.
申请公布号 KR20060134465(A) 申请公布日期 2006.12.28
申请号 KR20050054159 申请日期 2005.06.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JANG, JIN SU
分类号 H01L21/205;H01L21/02 主分类号 H01L21/205
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