| 摘要 |
An exposure apparatus includes an illumination optical system for illuminating a reticle with an exposure light, a projection optical system for projecting a pattern of the reticle onto a plate via a liquid supplied to a space between the projection optical system and the plate, and a measuring unit for measuring a refractive index of the liquid, wherein the measuring unit includes a light source for generating a measurement light having the same wavelength as that of the exposure light, a liquid reservoir for storing the liquid, the liquid reservoir having a transmitting surface for transmitting the measurement light and a reflecting surface for reflecting the measurement light, and a detector for detecting the measurement light via the liquid reservoir.
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