发明名称 METHOD OF CLEANING SEMICONDUCTOR SURFACES
摘要 Devices and methods of cleaning are described. The methods, and devices formed by the methods have a number of advantages. Embodiments are shown that include cleaning using a supercritical fluid. Advantages include a combination of both chemical and mechanical removal abilities from the supercritical fluid. Mechanical energy for cleaning is transmitted in a homogenous manner throughout a carrier fluid. The mechanical energy provided in methods shown also can also be used with delicate surface features.
申请公布号 US2006289033(A1) 申请公布日期 2006.12.28
申请号 US20060458863 申请日期 2006.07.20
申请人 MICRON TECHNOLOGY, INC. 发明人 FARRAR PAUL A.
分类号 B08B6/00;B08B7/00;H01L21/00;H01L21/306;H01L21/334;H01L21/8242 主分类号 B08B6/00
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