| 摘要 |
<p>A lithographic apparatus comprising: at least one of a support structure (MT) constructed to support a patterning object (MA), the patterning object (MA) being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a substrate table (WT) constructed to hold a substrate (W); and wherein at least one of the support structure (MT) and substrate table (WT) comprises a contact surface with which the patterning object (MA) and the substrate (W) are in contact, respectively, the contact surface comprising a plurality of sub-contact surfaces (20) to increase a mutual adhesion between at least one of the support structure (MT) and patterning object (MA) and the substrate table (WT) and substrate (W), respectively.</p> |
