发明名称 |
Composite system of scanning electron microscope and focused ion beam |
摘要 |
A composite system of a scanning electron microscope (SEM) and a focused ion beam apparatus (FIB) has an FIB lens barrel for irradiating a focused ion beam to an irradiating position on a sample surface and an SEM lens barrel for observing a machining state of the machined sample surface. The FIB lens barrel has an aperture defining at least one slit of a preselected pattern so that during irradiation of the sample surface with the focused ion beam, the aperture is irradiated by the focused ion beam with a width covering the slit to thereby machine the sample surface in the form of the preselected pattern of the slit.
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申请公布号 |
US7154106(B2) |
申请公布日期 |
2006.12.26 |
申请号 |
US20050058945 |
申请日期 |
2005.02.16 |
申请人 |
SII NANOTECHNOLOGY INC. |
发明人 |
OI MASAMICHI;OGAWA TAKASHI |
分类号 |
H01L21/66;H01J37/28;H01J37/305;H01J37/317;H01L21/00 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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