发明名称 Composite system of scanning electron microscope and focused ion beam
摘要 A composite system of a scanning electron microscope (SEM) and a focused ion beam apparatus (FIB) has an FIB lens barrel for irradiating a focused ion beam to an irradiating position on a sample surface and an SEM lens barrel for observing a machining state of the machined sample surface. The FIB lens barrel has an aperture defining at least one slit of a preselected pattern so that during irradiation of the sample surface with the focused ion beam, the aperture is irradiated by the focused ion beam with a width covering the slit to thereby machine the sample surface in the form of the preselected pattern of the slit.
申请公布号 US7154106(B2) 申请公布日期 2006.12.26
申请号 US20050058945 申请日期 2005.02.16
申请人 SII NANOTECHNOLOGY INC. 发明人 OI MASAMICHI;OGAWA TAKASHI
分类号 H01L21/66;H01J37/28;H01J37/305;H01J37/317;H01L21/00 主分类号 H01L21/66
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