发明名称 MIXING VALVE AND SEMICONDUCTOR MANUFACTURING APPARATUS USING THE SAME
摘要 A mixing valve and a semiconductor manufacture apparatus are provided to prevent a valve from being clogged by discharging residuals generated in the valve. A mixing valve(100) includes a valve body and a valve pad(150) and mixes plural inlet materials in a space defined by the valve body and the valve pad. The valve body includes inlets(120) and a partition wall(155). The inlets make the respective inlet materials flow into the mixing valve. The partition wall separates the inlets not to be connected when the valve body and the valve pad are contacted to close the inlets. The valve body includes an outlet(140). The outlet purges one of the inlet materials by using purge gas. The inlet material includes a liquid element and carrier gas. The carrier gas is used as the purge gas.
申请公布号 KR20060133312(A) 申请公布日期 2006.12.26
申请号 KR20050053109 申请日期 2005.06.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, DONG WON;CHOI, CHUL HWAN;KIM, DONG YOUNG;CHANG, SUNG HWAN
分类号 H01L21/02 主分类号 H01L21/02
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