| 摘要 |
A sputtering system includes a chamber with two frames therein. Several shafts are pivoted on the frames for rotation and transport. A shielding plate is placed above the shafts, and several adjustable mechanisms are between the frames and the shielding plate. Each of the adjustable mechanisms has an operation member on an exterior side of the chamber and an inner member in the chamber, which is connected to the operation member and the shielding plate. The inner member has a first section with a threaded hole and a second section with a threaded post screwed into the threaded hole of the first section. As a result, when the operation member is turned, the relative length and position of the inner member is changed to elevate or lower the shielding plate, and hence the gap between the carrier and the shielding plate can be adjusted to the desired allowable value.
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