MULTIPLE SCANNING MAGNETRONS

摘要

A sputter reactor configured for magnetron sputtering from a rectangular target (16) onto a rectangular panel (14) and including multiple magnetrons (140A, 140B) independently scannable across the back of the target. In one embodiment, the magnetrons scan only along paths parallel to one axis. A system controller (150) may control actuators (142 A, 142B) providing the mechanical movement and also control the amount of power delivered to the target in synchronism to the mechanical movement. The invention also includes scanning a magnetron in a rectangular path (132, 136, 134, 138) about the back of the rectangular target.