发明名称 EXHAUST APPARATUS OF ETCHING EQUIPMENT FOR SEMICONDUCTOR MANUFACTURING
摘要 An exhaust apparatus of semiconductor device manufacturing equipment is provided to detect easily an exhaust line clogged with polymer by checking the pressure values of exhaust lines using pressure gauges. An exhaust apparatus of semiconductor device manufacturing equipment includes a first exhaust line, a turbo pump, a second exhaust line, a dry pump, a third exhaust line, a scrubber, and a plurality of pressure gauges. The first exhaust line(110) is installed between a process chamber and the turbo pump(140). The second exhaust line(120) is installed between the turbo pump and the dry pump(150). The third exhaust line(130) is installed between the dry pump and the scrubber(160). The plurality of pressure gauges are installed on the first to third exhaust lines, respectively.
申请公布号 KR20060128195(A) 申请公布日期 2006.12.14
申请号 KR20050049432 申请日期 2005.06.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWON, KI PYO
分类号 H01L21/306 主分类号 H01L21/306
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