发明名称 PLASMA SOURCE OF DIRECTED BEAMS AND APPLICATION THEREOF TO MICROLITHOGRAPHY
摘要 The invention relates to a method for generating radiation in a range of desired wavelengths in a direction of emission. According to said method, initial radiation is produced by a radiation source, the wavelengths thereof including said desired range, and said initial radiation is filtered in such a way as to substantially eliminate the initial radiation beams having a wavelength outside the desired range. The inventive method is characterised in that the filtering is carried out by setting up a controlled distribution of the refractive index of the beams in a control region through which the initial radiation passes, in such a way as to selectively deviate the beams of the initial radiation according to the wavelength thereof and to recover the beams having desired wavelengths. The invention also relates to an associated device.
申请公布号 KR20060128865(A) 申请公布日期 2006.12.14
申请号 KR20067007406 申请日期 2006.04.17
申请人 EPPRA 发明人 CHOI PETER
分类号 G21K1/06;G03F7/20;H05G2/00 主分类号 G21K1/06
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