发明名称 Composition for forming a transparent conducting film, solution for forming a transparent conducting film and method of forming a transparent conducting film
摘要 The composition of the present invention is one for forming a transparent conducting film, the composition comprising a water-soluble indium compound, a halogen-containing water-soluble organotin compound and a water-soluble organic high molecular compound. A method for forming a transparent conducting film according to the invention comprises the steps of i) applying to a substrate a solution for forming a transparent conducting film containing the composition in water or a solvent comprising water and an organic solvent, and ii) firing the coating film. This method may further include iii) the step of subjecting the film obtained in the firing step ii) to a reducing heat treatment.
申请公布号 US7147805(B2) 申请公布日期 2006.12.12
申请号 US20030602906 申请日期 2003.06.24
申请人 NICHIA CORPORATION 发明人 MIYOSHI TAKASHI
分类号 C23C18/12;H01B1/02;B05D3/02;B05D5/12;C01G15/00;C01G19/00;C01G30/00;C09D1/00;C23C18/02;H01B1/08;H01B13/00;H01L21/288;H01L31/18 主分类号 C23C18/12
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