APPARATUS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

摘要

An apparatus for processing a semiconductor substrate is provided to stably maintain an inner temperature of a bake chamber by using a thermal entrance and exit blocking unit for controlling a thermal entrance and exit. A bake chamber(110) defines a space for performing a heating process on a semiconductor substrate. An opening unit where the semiconductor substrate goes in and out is formed on a side of the bake chamber. A heating unit provides heat for performing the heating process into the bake chamber. A thermal entrance and exit blocking unit injects air into the opening unit to control a thermal entrance and exit of the inside and outside of the bake chamber through the opening unit. The thermal entrance and exit blocking unit includes a blowing module(132). The blowing module absorbs the air in the bake chamber and injects it to cross the opening unit.