| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus of plasma surface treatment which can execute large area/equalizing processing by effectively solving a standing wave problem in application of VHF plasma and UHF plasma to a large area/equalization process. <P>SOLUTION: In the method and the apparatus, the outputs of a plurality of power sources each having a built-in high-frequency oscillator to be randomly phase-modulated by a random phase modulator are supplied to a pair of electrodes, thereby simultaneously generating a plurality of standing waves which are independent between the electrodes and never fluctuate in time/space, and the position of the antinode of each of the plurality of standing waves are individually controlled, thereby uniforming/equalizing the large area plasma. <P>COPYRIGHT: (C)2007,JPO&INPIT |
