发明名称 METHOD FOR MODIFICATION OF BUILT IN POTENTIAL OF DIODES
摘要 In broad terms the present invention is a semiconductor junction comprising a first material (102) and a second material (104), in which a surface of one or both of the junction materials has a periodically repeating structure that causes electron wave interference resulting in a change in the way electron energy levels within the junction are distributed.
申请公布号 WO2006079084(A3) 申请公布日期 2006.12.07
申请号 WO2006US02541 申请日期 2006.01.24
申请人 BOREALIS TECHNICAL LIMITED;TAVKHELIDZE, AVTO;BIBILASHVILI, AMIRAN;COX, RODNEY, T. 发明人 TAVKHELIDZE, AVTO;BIBILASHVILI, AMIRAN;COX, RODNEY, T.
分类号 H01L27/095;H01L29/207;H01L29/22;H01L29/47;H01L29/80;H01L29/861;H01L29/872;H01L31/0328;H01L31/0336;H01L31/0352;H01L31/072;H01L31/109;H01L33/24 主分类号 H01L27/095
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