发明名称 HEATING ARRANGEMENT AND PROCESS GAS TREATING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a heating arrangement for heating process gas efficiently in a short time, and to provide a process gas treating system for sustaining process gas at high temperature over a long distance in the downstream by heating the process gas to high temperature using the heating arrangement. SOLUTION: The heating arrangement comprises a heating channel section 200 for passing process gas, a heating element 500 consisting of a large sphere 501, an intermediate sphere 502 and a small sphere 503, and a coil 400 for induction heating the heating element 500 wherein process gas becoming turbulent flow by passing the heating element 500 is heated by touching the heating element 500 and the process gas is sustained at such a temperature as reaction secondary products do not adhere up to the end of an exhaust gas channel in the downstream. The process gas treating system employs such a heating arrangement 1 having enhanced heat generation efficiency. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006332086(A) 申请公布日期 2006.12.07
申请号 JP20050148947 申请日期 2005.05.23
申请人 HUGLE ELECTRONICS INC 发明人 YAMADA YUJI
分类号 H01L21/31;B01J3/00;C23C16/44;H05B6/10 主分类号 H01L21/31
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