发明名称 PLASMA TREATMENT EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma treatment equipment which can easily make a change of antenna and a change of gap. <P>SOLUTION: The plasma treatment equipment 100 has hermetically constructed and grounded, substantially cylindrical chamber 1, and an antenna component 30 is located on the chamber 1. The chamber 1 has a divided construction which is composed of an almost cylindrical housing 2, and a cylindrical chamber wall 3 joined on the housing 2 surrounding the treatment space. The chamber wall 3 is detachable. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006332554(A) 申请公布日期 2006.12.07
申请号 JP20050157840 申请日期 2005.05.30
申请人 TOKYO ELECTRON LTD 发明人 YAMASHITA JUN
分类号 H01L21/205;C23C16/511;H01L21/3065;H05H1/46 主分类号 H01L21/205
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