<p>Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.</p>
申请公布号
WO2006128613(A1)
申请公布日期
2006.12.07
申请号
WO2006EP04876
申请日期
2006.05.23
申请人
CARL ZEISS SMT AG;KALLER, JULIAN;DODOC, AURELIAN;FELDMANN, HEIKO;KAMENOV, VLADIMIR;EPPLE, ALEXANDER
发明人
KALLER, JULIAN;DODOC, AURELIAN;FELDMANN, HEIKO;KAMENOV, VLADIMIR;EPPLE, ALEXANDER
