PLASMA ETCHING DEVICE FOR PHOTOMASK, AND ETCHING METHOD

摘要

PROBLEM TO BE SOLVED: To realize a plasma etching device for photomask excellent in controllability of in-plane etching speed of a photomask substrate.

SOLUTION: The plasma etching device for photomask includes: lower electrodes 3a and 3b for generating plasma; and a lower electrode (a) for controlling electric capacity between the lower electrodes 3a and 3b and the photomask substrate 9 carried thereon.

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