发明名称 PLASMA TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To form apparently planar plasma on the surface facing a workpiece in electrodes. <P>SOLUTION: Minute linear plasma is generated in an atmospheric pressure reaction container 41 filled with a process gas by using an electrode having linear conductors 51a, 52a. The planar plasma can be apparently formed by diffusing the linear plasma by adjusting the process gas or a voltage application means 44. In this way, a plasma action range to the workpiece 45 can be expanded. Soft plasma treatment can be executed to the workpiece 45 since a discharge space is located in a space different from that of the workpiece 45. It is also possible to suppress particles from depositing to the workpiece 45. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006331664(A) 申请公布日期 2006.12.07
申请号 JP20050149074 申请日期 2005.05.23
申请人 SHARP CORP 发明人 YOSHIMOTO SHOZO;MURAKAMI KOJI;SUGIYAMA AKIRA;HAYASHI HIDEKAZU
分类号 H05H1/24 主分类号 H05H1/24
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