APPARATUS FOR SCANNING WAFER

摘要

An apparatus for scanning a wafer is provided to improve exposure efficiency at an edge of the wafer by moving a reticle stage and a wafer stage in an opposite direction and a perpendicular direction. A slit plate(120) makes a light incident from a light source(112) of a slit light. A reticle stage(140) supports a reticle(142) for transferring a circuit pattern on a wafer(w). A lens(150) reduces the light passing through the reticle to transmit it to the wafer. A wafer stage(160) supports the wafer. A driving direction of the reticle stage and the wafer stage is rotated to move the reticle stage and the wafer stage to a perpendicular direction. A first driving unit(162) moves the wafer stage to an x or y axis. A second driving unit(144) moves the reticle stage to the x axis or a y axis. A controlling unit(180) controls the first and second driving units.