| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate with a light shielding film having optical characteristics and durability (patterning properties, etching characteristics, heat resistance and moisture resistance) equal to or above those of a Cr/Cr compound or a substrate with a low reflection film composed of a light shielding layer and an absorption layer. SOLUTION: The substrate with a light shielding film is obtained by using a sputtering target composed of an alloy or a metallic sintered body for thin film deposition substantially consisting of Ni and V and containing, by atom, 26 to 52% V and depositing either a thin film of the oxide, nitride or oxide nitride of Ni and V. The substrate with a low reflection film is obtained by stacking an absorption layer in which either one or more layers of thin films of the oxide, nitride or oxide nitride of Ni and V are staked and a light shielding layer in which either one layer of thin films of the alloy of Ni and V, or the oxide, nitride or oxide nitride of Ni and V is stacked are laminated in this order. |
