发明名称 Apparatus and method for evaluating semiconductor material
摘要 An apparatus for evaluating semiconductor material having a pump laser configured to irradiate a pump beam modulated at a modulation frequency on a semiconductor wafer, a probe laser configured to irradiate a probe beam on the semiconductor wafer, and a detector configured to detect a reflection of the probe beam from the semiconductor wafer.
申请公布号 US7145658(B2) 申请公布日期 2006.12.05
申请号 US20030635539 申请日期 2003.08.07
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 AKUTSU HARUKO;RIKIMARU KATSUMI;SUGURO KYOICHI;SHIMA TATSUYA;KAWASE YOSHIMASA;MURAKOSHI ATSUSHI
分类号 G01N21/41;H01L21/66;G01N21/17 主分类号 G01N21/41
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