METHOD FOR COMPENSATING DATA OF WAFER INSPECTION SYSTEM

摘要

A method for compensating data of a wafer inspection system is provided to compensate optical signal data and obtain correct for a wafer by using differential data obtained from optical reference signal data. First optical signal data are obtained from a reference wafer by using a wafer inspection system(S100). The first optical signal data and the reference wafer are compared with optical reference signal data in order to produce differential data(S200). Second optical signal data are obtained from a target wafer by using the wafer inspection system(S300). The second optical signal data are compensated by using the differential data(S400).